4. Etching.zip
Etching (Step 4: Semiconductor Manufacturing Process) Etching is a key step in semiconductor manufacturing that involves selectively removing material from the wafer surface to form microscopic patterns created during photolithography. This process transfers the circuit design from the photoresist layer into underlying materials such as silicon, oxide, or metal.
It is important to distinguish between well-etched (good) and defect-prone (not good) patterns:
A good etching process produces precise, clean, and uniform patterns that accurately replicate the mask design.
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Sharp and well-defined etched features
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Uniform depth
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Smooth etched surfaces, clean profiles
Poor etching can introduce defects such as undercutting, residual photoresist, rough or sloped sidewalls, or incomplete material removal.
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Undercutting
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Scalloping or sidewall roughness
Including both good and defective etching images helps in understanding the process quality and identifying potential issues in pattern transfer.
추가 정보
| 필드 | 값 |
|---|---|
| 마지막으로 업데이트된 데이터 | 2025년 7월 29일 |
| 마지막으로 업데이트된 메타데이터 | 2025년 7월 29일 |
| 생성됨 | 2025년 7월 8일 |
| 포맷 | ZIP |
| 라이센스 | 라이센스를 제공하지 않음 |
| Datastore active | False |
| Has views | True |
| Id | 5067bdc6-575c-45cb-870c-a9f7ac8fa38e |
| Mimetype | application/zip |
| Package id | 2c245f98-7096-4025-b59e-580fa01539a5 |
| Position | 3 |
| Size | 1.3 MiB |
| State | active |
| Url type | upload |