4. Etching.zip
Etching (Step 4: Semiconductor Manufacturing Process) Etching is a key step in semiconductor manufacturing that involves selectively removing material from the wafer surface to form microscopic patterns created during photolithography. This process transfers the circuit design from the photoresist layer into underlying materials such as silicon, oxide, or metal.
It is important to distinguish between well-etched (good) and defect-prone (not good) patterns:
A good etching process produces precise, clean, and uniform patterns that accurately replicate the mask design.
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Sharp and well-defined etched features
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Uniform depth
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Smooth etched surfaces, clean profiles
Poor etching can introduce defects such as undercutting, residual photoresist, rough or sloped sidewalls, or incomplete material removal.
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Undercutting
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Scalloping or sidewall roughness
Including both good and defective etching images helps in understanding the process quality and identifying potential issues in pattern transfer.
其他資訊
| 欄位 | 值 |
|---|---|
| 最後更新資料 | 2025年7月29日 |
| 最後更新的後設資料 | 2025年7月29日 |
| 建立 | 2025年7月8日 |
| 格式 | ZIP |
| 授權 | 沒有可使用的許可 |
| Datastore active | False |
| Has views | True |
| Id | 5067bdc6-575c-45cb-870c-a9f7ac8fa38e |
| Mimetype | application/zip |
| Package id | 2c245f98-7096-4025-b59e-580fa01539a5 |
| Position | 3 |
| Size | 1.3 MiB |
| State | active |
| Url type | upload |